Mark Baker, is a Reader in Surface Science and Engineering and a member of the Engineering Materials Research Centre in the Department of Mechanical Engineering Sciences, University of Surrey. He was appointed as a Lecturer in the Department in 1999 and previsly worked at EU Institute of Advanced Materials, Ispra, Italy and GEC Hirst Research Centre, London. His principal research interests are materials characterisation using XPS, AES, SEM, TEM, XRD, AFM, FIB in application areas such as inorganic thin films, coatings and corrosion.

X-ray photoelectron spectroscopy - a versatile thin film analysis technique

Mark Baker

Department of Mechanical Engineering Sciences, University of Surrey, Guildford, Surrey, GU2 7XH, UK

X-ray photoelectron Spectroscopy (XPS) is a mature analytical technique for determination of the chemical composition of surfaces. The presentation will consider the powerful nature of the technique in providing quantified chemical compositions, chemical state information and its versatility in varying the depth of analysis, from the outer monolayers of a surface (angle resolved XPS) to deeper into the bulk (XPS depth profiling). Case studies will be presented with particular reference to its application on inorganic thin films and coatings. These will consider how XPS combined with other well-established analytical techniques, such as XRD and TEM, can provide a comprehensive characterisation of nanocomposite coatings and multi-layer thin films, yielding a deeper understanding of the process-structure-properties relationship. The emergence of argon cluster depth profiling as a new XPS analytical tool will also be considered.